Reflectometry-Based Technique for Characterising Complex Thin-Film Structures (Aalto U. et al.)

A new technical paper, “Characterisation of Complex Multilayer Nanostructures with High Aspect Ratio,” was recent published by researchers at Aalto University, University of Eastern Finland, Chipmetrics OY, and VTT MIKES. Abstract “Deposition studies of deep vertical dips on semiconductor wafers can